Effect of target-substrate distance on thickness and hardness of carbon thin films on SKD11 steel using target material from battery carbon rods

Carbon thin films on SKD11 steel were deposited by 40 kHz frequency plasma sputtering technique using a waste of battery carbon rods in argon plasma, and their mechanical properties investigated various target-substrate distances (1 cm, 1.7 2 2.4 cm). The power used is 340 watts, the vacuum time 90 minutes, gas flow rate 80 ml/minute. deposition 120 minutes with initial temperature (temperature during vacuum) 28 oC final (the after sputtering) 300 oC. hardness value distance was tested Vickers microhardness test. Testing thickness substrate carried out Nikon type 59520 optical microscope. Qualitative analysis at scale 20 μm shown an Qualitatively, film cm looks brightest thickest than other variations. Based test microscope, 1 to average increased from 10,724 (286.6 HV) 13,332 (335.9 HV). Furthermore, variation continued decrease 13.332 7.257 (257.3 possibility interrupting atoms colliding inert conditions increases long distance, thus causing flux